The EM TIC 3x and EM RES102 ion etching systems from Leica Microsystems.
Leica’s range of ion etching systems includes SEM and PEM variants. Both solutions are automated systems offering flexible configuration of all parameters required for operation.The Leica EM TIC 3x SEM system is equipped with three ion guns, which significantly speeds up the etching process. The Leica EM RES102 system for PEM is fitted with two ion guns, which can process the sample from one or both sides at the user’s discretion, making it possible to use this model for SEM as well.
